A Study on the Process of Plasma-Enhanced Chemical Vapor Deposition of (Al<subscript>x</subscript>Ga<subscript>1 –</subscript><subscript>x</subscript>)<subscript>2</subscript>O<subscript>3</subscript> Thin Films
In: High Energy Chemistry, Jg. 57 (2023-10-01), Heft 5, S. 430-435
Online
academicJournal
Zugriff:
Titel: |
A Study on the Process of Plasma-Enhanced Chemical Vapor Deposition of (Al<subscript>x</subscript>Ga<subscript>1 –</subscript><subscript>x</subscript>)<subscript>2</subscript>O<subscript>3</subscript> Thin Films
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Autor/in / Beteiligte Person: | Mochalov, L. A. ; Kudryashov, M. A. ; Prokhorov, I. O. ; Vshivtsev, M. A. ; Kudryashova, Yu. P. ; Knyazev, A. V. |
Link: | |
Zeitschrift: | High Energy Chemistry, Jg. 57 (2023-10-01), Heft 5, S. 430-435 |
Veröffentlichung: | 2023 |
Medientyp: | academicJournal |
ISSN: | 0018-1439 (print) ; 1608-3148 (print) |
DOI: | 10.1134/s0018143923050065 |
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