Plasma Ignition via High-Power Virtual Perfect Absorption
In: ISSN: 2330-4022 ; ACS photonics ; https://hal.science/hal-04512432 ; ACS photonics, 2023, 10 (10, 2023
Online
academicJournal
Zugriff:
International audience ; Plasma ignition is critical in various scientific and industrial applications, demanding an efficient and robust execution mechanism. In this work, we present an innovative approach to plasma ignition by incorporating an analysis of fundamental aspects of light scattering in the complex frequency plane. We demonstrate the high-power virtual perfect absorption (VPA) regime, which is a method for perfectly capturing light within a resonator. By carefully designing the temporal profile of the incident wave, we effectively minimize reflections during the ignition stages, thereby significantly enhancing the efficiency and resilience of the process. Through comprehensive experimental investigations, we validate the viability of this approach, establishing VPA as a powerful tool for reflectionless excitation and optimal control of plasma discharges. By addressing the limitations of conventional plasma ignition methods, this research provides promising implications for improving the performance and sustainability of numerous applications related to plasma technology.
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Plasma Ignition via High-Power Virtual Perfect Absorption
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Autor/in / Beteiligte Person: | Delage, Théo ; Sokoloff, Jérôme ; Pascal, Olivier ; Mazières, Valentin ; Krasnok, Alex ; Callegari, Thierry ; LAboratoire PLasma et Conversion d'Energie (LAPLACE) ; Université Toulouse III - Paul Sabatier (UT3) ; Université de Toulouse (UT)-Université de Toulouse (UT)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP) ; Université de Toulouse (UT) ; Institut Supérieur de l'Aéronautique et de l'Espace (ISAE-SUPAERO) ; Florida International University Miami (FIU) ; Photonics, ACS |
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Zeitschrift: | ISSN: 2330-4022 ; ACS photonics ; https://hal.science/hal-04512432 ; ACS photonics, 2023, 10 (10, 2023 |
Veröffentlichung: | HAL CCSD ; American Chemical Society, 2023 |
Medientyp: | academicJournal |
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