Modelling Of Surface Reactions For Predicting Dry-etched Profiles
In: [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD, 2005
Online
Konferenz
Zugriff:
Titel: |
Modelling Of Surface Reactions For Predicting Dry-etched Profiles
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Autor/in / Beteiligte Person: | Harafuji, K. ; Misaka, A. ; Kubota, M. ; Nomura, N. |
Link: | |
Zeitschrift: | [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD, 2005 |
Veröffentlichung: | IEEE, 2005 |
Medientyp: | Konferenz |
DOI: | 10.1109/vpad.1993.724729 |
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