The quartz-envelope heater: A new heater for metal-organic chemical vapor deposition systems.
In: Journal of Electronic Materials, Jg. 14 (1985-09-01), Heft 5, S. 587-615
Online
academicJournal
Zugriff:
Two methods are currently used for heating substrates in metal-organic chemical vapor deposition (MOCVD): rf heating and quartz lamp heating. This paper reports a new method, the quartz-envelope heater, and describes its use for producing undoped GaAs with AsH and TMG in an MOCVD system. Also discussed are growth-rate and morphological studies, variations of electrical properties with different growth parameters, and refinements to the present heater design. [ABSTRACT FROM AUTHOR]
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Titel: |
The quartz-envelope heater: A new heater for metal-organic chemical vapor deposition systems.
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Autor/in / Beteiligte Person: | Boldish, S. ; Ciofalo, J. ; Wendt, J. |
Link: | |
Zeitschrift: | Journal of Electronic Materials, Jg. 14 (1985-09-01), Heft 5, S. 587-615 |
Veröffentlichung: | 1985 |
Medientyp: | academicJournal |
ISSN: | 0361-5235 (print) |
DOI: | 10.1007/BF02654027 |
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