Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride.
In: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, Jg. 41 (2023-12-01), Heft 6, S. 1-7
Online
academicJournal
Zugriff:
Gallium nitride (GaN) has attracted significant interest as a next-generation semiconductor material with various potential applications. During metalorganic chemical vapor deposition (MOCVD) of GaN using trimethyl gallium (TMG) and NH 3 , dimeric precursors are produced by gas-phase reactions such as adduct formation or thermal decomposition. In this work, the surface adsorption reactions of monomeric and dimeric Ga molecules including TMG, [(CH 3 ) 2 Ga(NH 2 )] 2 , and [(CH 3 )GaNH] 2 on the GaN surface are investigated using density functional theory calculations. It is found that [(CH 3 ) 2 Ga(NH 2 )] 2 is the most predominant form among the various dimeric precursors under typical GaN MOCVD process conditions. Our results indicate that the dimeric [(CH 3 )GaNH] 2 precursor, which is generated through the thermal decomposition of [(CH 3 ) 2 Ga(NH 2 )] 2 , would have higher reactivity on the GaN surface. Our work provides critical insights that can inform the optimization of GaN MOCVD processes, leading to advancements in GaN-based high-performance semiconductors. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites or posted to a listserv without the copyright holder's express written permission. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Titel: |
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride.
|
---|---|
Autor/in / Beteiligte Person: | Kim, Hankyu ; Kim, Miso ; Kim, Bumsang ; Shong, Bonggeun |
Link: | |
Zeitschrift: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, Jg. 41 (2023-12-01), Heft 6, S. 1-7 |
Veröffentlichung: | 2023 |
Medientyp: | academicJournal |
ISSN: | 0734-2101 (print) |
DOI: | 10.1116/6.0002966 |
Schlagwort: |
|
Sonstiges: |
|