High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH)<subscript>2</subscript>/CaO Immobilization.
In: IEEE Transactions on Semiconductor Manufacturing, Jg. 21 (2008-11-01), Heft 4, S. 668-675
Online
academicJournal
Zugriff:
Titel: |
High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH)<subscript>2</subscript>/CaO Immobilization.
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Autor/in / Beteiligte Person: | Suzuki, Katsumasa ; Ishihara, Yoshio ; Sakoda, Kaoru ; Shirai, Yasuyuki ; Teramoto, Akinobu ; Hirayama, Masaki ; Ohmi, Tadahiro ; Watanabe, Takayuki ; Ito, Takashi |
Link: | |
Zeitschrift: | IEEE Transactions on Semiconductor Manufacturing, Jg. 21 (2008-11-01), Heft 4, S. 668-675 |
Veröffentlichung: | 2008 |
Medientyp: | academicJournal |
ISSN: | 0894-6507 (print) |
DOI: | 10.1109/TSM.2008.2005400 |
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