Characterizations of CrN/a-CN <subscript>x</subscript> nanolayered coatings deposited by DC reactive magnetron sputtering of Cr and graphite targets
In: Vacuum, Jg. 86 (2011-09-02), Heft 2, S. 206-209
Online
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Zugriff:
Abstract: CrN/a-CN x nanolayered coatings have been deposited by DC reactive magnetron sputtering of pure Cr and graphite targets. The total thickness is 1μm and that of a-CN x layers is kept constant at 3.5nm. The period (bilayer thickness) is in the range 8–16nm. CrN and a-CN x layers are crystalline and amorphous respectively. The decrease of CrN layers’ thickness (decrease of period) in the stack leads to refinement of CrN microstructure associated with (200) preferred orientation. The hardness of nanolayered films is independent of the period’s thickness, while internal compressive stress, which remains between that of each elementary layer, follows an evolution close to that of the law of mixtures. The best tribological behaviours are reached for a periods’ thickness of 8nm. [Copyright &y& Elsevier]
| Titel: |
Characterizations of CrN/a-CN <subscript>x</subscript> nanolayered coatings deposited by DC reactive magnetron sputtering of Cr and graphite targets
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| Autor/in / Beteiligte Person: | Briois, P. ; Mercs, D. ; Demange, V. ; Banakh, O. ; Sanchette, F. ; Billard, A. |
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| Zeitschrift: | Vacuum, Jg. 86 (2011-09-02), Heft 2, S. 206-209 |
| Veröffentlichung: | 2011 |
| Medientyp: | academicJournal |
| ISSN: | 0042-207X (print) |
| DOI: | 10.1016/j.vacuum.2011.06.008 |
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