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- issn: 0167-9317 4 Treffer
- 2017 sispad proceedings ; 2017 international conference on simulation of semiconductor processes and devices (sispad) ; https://hal.science/hal-02007238 ; 2017 international conference on simulation of semiconductor processes and devices (sispad), sep 2017, kamakura, japan. pp.329-332, ⟨10.23919/sispad.2017.8085331⟩ 3 Treffer
- 2018 sispad proceedings ; 2018 international conference on simulation of semiconductor processes and devices (sispad) ; https://hal.science/hal-02007657 ; 2018 international conference on simulation of semiconductor processes and devices (sispad), sep 2018, austin, united states. pp.115-118, ⟨10.1109/sispad.2018.8551653⟩ 3 Treffer
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49 Treffer
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In: 2018 EUROSOI-ULIS Proceedings ; 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ; https://hal.science/hal-02007264 ; 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Mar 2018, Granada, Spain. pp.9-12, ⟨10.1109/ULIS.2018.8354341⟩, 2018KonferenzZugriff:
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In: 2018 SISPAD Proceedings ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007274 ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2018, Austin, United States. pp.198-201, ⟨10.1109/SISPAD.2018.8551674⟩, 2018KonferenzZugriff:
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In: 2018 SISPAD Proceedings ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007657 ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2018, Austin, United States. pp.115-118, ⟨10.1109/SISPAD.2018.8551653⟩, 2018KonferenzZugriff:
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In: SISPAD 2017 ; https://cea.hal.science/cea-02270891 ; SISPAD 2017, Sep 2017, Kamakura, Japan, 2017Online KonferenzZugriff:
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In: 20th International Conference on Insulating Films on Semiconductors (INFOS 2017) ; https://hal.science/hal-02071682 ; 20th International Conference on Insulating Films on Semiconductors (INFOS 2017), Jun 2017, Potsdam, Germany, 2017KonferenzZugriff:
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In: SISPAD 2017 ; https://cea.hal.science/cea-02270891 ; SISPAD 2017, Sep 2017, Kamakura, Japan, 2017Online KonferenzZugriff:
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In: 2017 SISPAD Proceedings ; 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007145 ; 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2017, Kamakura, Japan. pp.321-324, ⟨10.23919/SISPAD.2017.8085329⟩, 2017KonferenzZugriff:
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In: 2017 SISPAD Proceedings ; 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007238 ; 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2017, Kamakura, Japan. pp.329-332, ⟨10.23919/SISPAD.2017.8085331⟩, 2017KonferenzZugriff:
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In: SISPAD 2017 ; https://cea.hal.science/cea-02270891 ; SISPAD 2017, Sep 2017, Kamakura, Japan, 2017Online KonferenzZugriff:
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In: SISPAD 2017 ; https://hal-cea.archives-ouvertes.fr/cea-02270891 ; SISPAD 2017, Sep 2017, Kamakura, Japan, 2017Online KonferenzZugriff:
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In: 2016 ESSDERC Proceedings ; 2016 ESSDERC - 46th European Solid-State Device Research Conference ; https://hal.science/hal-02006273 ; 2016 ESSDERC - 46th European Solid-State Device Research Conference, Sep 2016, Lausanne, Switzerland. pp.210-213, ⟨10.1109/ESSDERC.2016.7599623⟩, 2016KonferenzZugriff:
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In: 2016 S3S Proceedings ; 2016 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S) ; https://hal.science/hal-02006297 ; 2016 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), Oct 2016, Burlingame, United States. pp.1-2, ⟨10.1109/S3S.2016.7804402⟩, 2016KonferenzZugriff:
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In: 2016 ESSDERC Proceedings ; 2016 ESSDERC - 46th European Solid-State Device Research Conference ; https://hal.science/hal-02006285 ; 2016 ESSDERC - 46th European Solid-State Device Research Conference, Sep 2016, Lausanne, Switzerland. pp.117-120, ⟨10.1109/ESSDERC.2016.7599602⟩, 2016KonferenzZugriff:
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In: ISSN: 0167-9317, 2017academicJournalZugriff:
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In: ISSN: 0018-9383 ; IEEE Transactions on Electron Devices ; https://hal.science/hal-02006362 ; IEEE Transactions on Electron Devices, 2017, 64 (11), pp.4486-4491. ⟨10.1109/TED.2017.2751141⟩, 2017academicJournalZugriff:
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In: 2018 EUROSOI-ULIS Proceedings ; 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ; https://hal.science/hal-02007264 ; 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Mar 2018, Granada, Spain. pp.9-12, ⟨10.1109/ULIS.2018.8354341⟩, 2018KonferenzZugriff:
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In: 2018 SISPAD Proceedings ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007274 ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2018, Austin, United States. pp.198-201, ⟨10.1109/SISPAD.2018.8551674⟩, 2018KonferenzZugriff:
-
In: 2018 SISPAD Proceedings ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007657 ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2018, Austin, United States. pp.115-118, ⟨10.1109/SISPAD.2018.8551653⟩, 2018KonferenzZugriff:
-
In: 2018 EUROSOI-ULIS Proceedings ; 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ; https://hal.science/hal-02007264 ; 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Mar 2018, Granada, Spain. pp.9-12, ⟨10.1109/ULIS.2018.8354341⟩, 2018KonferenzZugriff:
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In: 2018 SISPAD Proceedings ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ; https://hal.science/hal-02007274 ; 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Sep 2018, Austin, United States. pp.198-201, ⟨10.1109/SISPAD.2018.8551674⟩, 2018KonferenzZugriff: